説明
Mostly used for NPI products構成
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEMモデルの説明
提供なしドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
143004
ウェーハサイズ：
不明
ヴィンテージ：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
AJA INTERNATIONAL, INC
ATC-ORION 8
カテゴリ
PVD / Sputtering
最終検証： 7日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
143004
ウェーハサイズ：
不明
ヴィンテージ：
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Mostly used for NPI products構成
-Configured with 5 sputter heads -Configured for DC sputtering -Was used to deposit Cu, Au, Ti, Co, Ni, Pd, Pt, Ir, and Sn -Used with argon gas -Base pressure was 2 * 10^-7 Torr -No substrate heater -Substrate size is configured for 1” diameter wafers, but this can be changed as needed. The deposition platen is approximately 7” in diameter -Cathode target diameter is 3” -Included 3 DC power supplies and 1 RF supplyOEMモデルの説明
提供なしドキュメント
ドキュメントなし