説明
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN構成
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136521
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
ENDURA II
カテゴリ
PVD / Sputtering
最終検証： 6日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
136521
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2014
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
AMAT ENDURA2 CH2 - ALD TiN, CH3 - ALD TiN,CH5 - ALD TiN (3x Chamber breakout) Asset Description Applied Endura Centinel ALD TiN Software Version: NA CIM: NA Process: ALD TiN構成
x3 Chambers Hardware Configuration System Type Description Quantity Handler System NA Options System stand-alone ALD TiN chambers 3 Main System NONE Factory Interface NONE Others Excluded Items List (Pumps, Chillers & Abatement are all excluded) NONEOEMモデルの説明
The Applied Materials ENDURA II is a highly advanced platform used in the semiconductor industry for physical vapor deposition (PVD) processes. It is designed to deposit thin films of various materials onto semiconductor wafers with exceptional precision and uniformity.ドキュメント
ドキュメントなし