説明
説明なし構成
Applied Materials Endura 5500 Metal Deposition PVD - Factory Interface: 4.0 - 25-wafer FOUP Loadports (3) - PVD Endura Type Controller - PVD Endura Type Remote Generator Rack - Cryo Compressor - Thermo Neslab Heat Exchanger - Edwards iQDP80/IQMB250 pump systems for loadlock, system, and process chambers (may not be included) - CE Mark - No HDDOEMモデルの説明
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
ENDURA 5500
検証済み
カテゴリ
PVD / Sputtering
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102819
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
ENDURA 5500
カテゴリ
PVD / Sputtering
最終検証： 23日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
102819
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Applied Materials Endura 5500 Metal Deposition PVD - Factory Interface: 4.0 - 25-wafer FOUP Loadports (3) - PVD Endura Type Controller - PVD Endura Type Remote Generator Rack - Cryo Compressor - Thermo Neslab Heat Exchanger - Edwards iQDP80/IQMB250 pump systems for loadlock, system, and process chambers (may not be included) - CE Mark - No HDDOEMモデルの説明
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.ドキュメント
ドキュメントなし