説明
説明なし構成
the DI board, Cryo control board, and C3 lift driver are either missing or defective. The configuration of the endura's sputter chambers is as follows: W 2ch and WSi 1ch. It does not include PreClean or PreHeat. DP is included.OEMモデルの説明
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.ドキュメント
ドキュメントなし
APPLIED MATERIALS (AMAT)
ENDURA 5500
検証済み
カテゴリ
PVD / Sputtering
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
116419
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
APPLIED MATERIALS (AMAT)
ENDURA 5500
カテゴリ
PVD / Sputtering
最終検証： 30日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
116419
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
the DI board, Cryo control board, and C3 lift driver are either missing or defective. The configuration of the endura's sputter chambers is as follows: W 2ch and WSi 1ch. It does not include PreClean or PreHeat. DP is included.OEMモデルの説明
AMAT leveraged its expertise in single-wafer, multichamber architecture to develop an evolutionary platform called the Endura 5500 PVD (physical vapor deposition) in 1990 featuring a staged, ultra-high vacuum architecture for the rapid sputtering of aluminum and other metal films used to form the circuit interconnections on advanced devices.ドキュメント
ドキュメントなし