説明
Denton Vacuum Explorer 14 Three Target RF and DC Sputtering System. Vacuum deposition system designed for thin film applications. All process variables are controlled by system computer via graphical user interface. System was upgraded by Denton in 2012 at the factory to include RF/DC magnetron sputtering and software update. System has three 4” diameter magnetron cathodes. Three MKS mass flow controllers for process gas input. 12-inch diameter rotating substrate carrier is heated by quartz lamp under platen. CTI cryopump with compressor and roughing pump. System has scratches on paint from shipping.構成
構成なしOEMモデルの説明
Denton Vacuum Explorer 14 Auto Turbo High Vacuum DC Sputtering Systemドキュメント
ドキュメントなし
カテゴリ
PVD / Sputtering
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
121010
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
DENTON VACUUM
EXPLORER 14
カテゴリ
PVD / Sputtering
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
121010
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Denton Vacuum Explorer 14 Three Target RF and DC Sputtering System. Vacuum deposition system designed for thin film applications. All process variables are controlled by system computer via graphical user interface. System was upgraded by Denton in 2012 at the factory to include RF/DC magnetron sputtering and software update. System has three 4” diameter magnetron cathodes. Three MKS mass flow controllers for process gas input. 12-inch diameter rotating substrate carrier is heated by quartz lamp under platen. CTI cryopump with compressor and roughing pump. System has scratches on paint from shipping.構成
構成なしOEMモデルの説明
Denton Vacuum Explorer 14 Auto Turbo High Vacuum DC Sputtering Systemドキュメント
ドキュメントなし