説明
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function構成
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEMモデルの説明
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.ドキュメント
ドキュメントなし
検証済み
カテゴリ
PVD / Sputtering
最終検証： 21日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138432
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
PERKIN ELMER
4450
カテゴリ
PVD / Sputtering
最終検証： 21日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138432
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
DC magnetron Sputter, RF magnetron Sputter 1-3 of cathode. Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode Perkin-Elmer 4410 4450 Sputtering Deposition Equipment Delta Cathode small sample to 8 inch wafer 1-2 gas lines with MFC RF Etch Bias function Loadlock heating function Chamber heating function (Occupy one cathode port). Co-Sputter function Reactive sputter function構成
Efficient 8″ round cathodes High throughput operation High Uniformity DC, RF Etch and Bias operation Ultra Clean vacuum system Load lock operation UHV design Flexible for development or production use Substrates up to 6″ diameter Various pumping and power options RF/RF co-sputtering option Optional gas controllersOEMモデルの説明
The Perkin-Elmer 4450 is a type of sputtering system that belongs to the Perkin-Elmer 4400 Series. It is similar to the Model 4410, but has additional features such as load lock pumping and substrate heating. The system can operate automatically and has three Delta™ cathode positions, one of which can be replaced with an in-process heater fixture. The Perkin-Elmer 4450 Sputter Deposition System is designed to be flexible and offers a variety of operating and process modes.ドキュメント
ドキュメントなし