説明

I got two used Japan-made Shibaura High Vacuum Thin Sputtering Equipment. It would be used for R&D purpose equipment as that for R&D of surface modification and coatings solutions provider. These are Shibaura made in Japan PVD sputtering for Titan and silica Vacuum thin coating equipment. It can be used for the R&D and test pilot productions.Shibaura made “Photo Catalysts (Hydrophilic) Sputtering Equipment” ; Model : BM-1400PC : Wafer 250mm (10 inches) Model : BM-1800PC : Wafer 360mm (15 inches) I will suggest the best price to you with cheap. Installed and Vintaged : it was installed in 2006 and 2007. Vintaged in July, 2024, Now can be testable and operatable in any time Made : Shibaura, Japan Also we do have cleansing equipment for pre cleaning the substrate and do have some Sio2 Target 99.99%. Application : Hydrophilic coating, sensors, MEMS application and thin coating applications. It can used for R&D of surface modification and coatings solutions provider. Total 7 Chambers : 1 Heating chamber, 6 processing chambers (Total 7 chamber) operated continuously. It is installed in a clean room and now operates and produces the ITO mirror. If you give your e mail and the detailed spec and photo will be delivered to you. Look forward to receiving your kind and aggressive response. Thanks and best regards,

構成

Features ;  World's highest speed mass production sputtering technology for optical discs.  Film characteristics dramatically better than with conventional methods (coating or evaporation)  Environmentally conscious design in terms of space saving and energy saving  Application : Hydrophilic coating, sensors, MEMS application and thin coating applications.  1 Heating chamber, 6 processing chambers (Total 7 chamber) with Heating unit included.  Max Substrate size : diameter 360mm,. and its thickness 2.0mm  Sputtering thickness 120nm(TiO2) 7nm (T-SiO2) 50nm (B-SiO2)  Technical Topics : refer to the web http://www.shibatec.com/products/vacuum/topics_01.html