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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
  • ULVAC SME-200J
説明
A mask bonding system that transfers the wafer and mask to the sputtering device chamber L after bonding for film deposition processing.
構成
Wafer: 8 inches, processed one by one Metal Mask: Φ230 mm × t100 μm Configuration: L chamber × 1 T chamber × 1 Etching chamber × 1 Sputtering chamber × 4 Transfer Chamber: Robot with 2 pick-up specifications Etching Chamber: Power supply antenna 1KW, Bias: 600W, Substrate electrode water-cooled electrostatic chuck Sputtering Chamber: 4 chambers, Cathode: Magnet rotary cathode (upper side), DC: 10KW, Substrate electrode: Water-cooled electrostatic chuck
OEMモデルの説明
提供なし
ドキュメント

ドキュメントなし

ULVAC

SME-200J

verified-listing-icon

検証済み

カテゴリ
PVD / Sputtering

最終検証: 60日以上前

主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

110833


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

ULVAC

SME-200J

verified-listing-icon
検証済み
カテゴリ
PVD / Sputtering
最終検証: 60日以上前
listing-photo-c5c6b7c2f12e4b6abd5f7a1f24fb2acd-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/55031/c5c6b7c2f12e4b6abd5f7a1f24fb2acd/ddd3726e3c5342648910e5c871535541_img5911_mw.jpg
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主なアイテムの詳細

状態:

Used


稼働ステータス:

不明


製品ID:

110833


ウェーハサイズ:

8"/200mm


ヴィンテージ:

不明


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
A mask bonding system that transfers the wafer and mask to the sputtering device chamber L after bonding for film deposition processing.
構成
Wafer: 8 inches, processed one by one Metal Mask: Φ230 mm × t100 μm Configuration: L chamber × 1 T chamber × 1 Etching chamber × 1 Sputtering chamber × 4 Transfer Chamber: Robot with 2 pick-up specifications Etching Chamber: Power supply antenna 1KW, Bias: 600W, Substrate electrode water-cooled electrostatic chuck Sputtering Chamber: 4 chambers, Cathode: Magnet rotary cathode (upper side), DC: 10KW, Substrate electrode: Water-cooled electrostatic chuck
OEMモデルの説明
提供なし
ドキュメント

ドキュメントなし