説明

Same as SIV-500 but used a carrier to process 3 each 6 inch wafers. • 3-station process module (P1. P2. P3) • 5 KW pulsed DC power supply • P3 dedicated to ITO or other Transparent Conductive Films <TCF) • P3 has 02 MFC & 13.56 MHz power supply/match to maintain ITO stoichiometry • L/L: has a roughing pump and water pump • Process chamber has a roughing pump. ·red to a turbo/water pump & a cryo pump SIV200 - Auto-Load (3) 6' wafers on 200mm x 200mm carrier - Front-end stocker holds (6) carriers - Uses Ulvac 10· cryo & 10· water pump/ turbo Details Attached

構成

System Specs: • System is optimized to deposit transparent conductive oxides like ITO and AZO • The SIV 200 can process substrates that fit on a 200 x 450mm carrier. • System includes a stocker for automatic processing of six carriers (holding (3) 150mm wafers) so can process 18 wafers automatically. • System uses side sputter technique to minimize particle generation. Carriers are set on edge with the cathodes and targets perpendicular to the floor . • System utilizes a L/L and a vacuum system with 10 inch cryo pumps and 10 inch conductance to quickly achieve a low base and crossover pressure, increasing throughput • System uses process cooling water to keep the cathode/targets, pumps and power supplies at a constant temperature. • System uses an Rf magnetron powered by an A/E Pinacle Plus 5k 13.56 MHz Rf generator and match. The magnet moves across the target via a worm drive mechanism that has variable speeds. • The deposition thickness is inversely proportional to the carrier speed which is programable and precisely controlled by a motorized belt drive. VACUUM COMPONENTS: 1. Ulvac Cryo-U10HSP 2. VTEK Penduroll gate valve 3. Ulvac Cryo-U10HSP 4. VTEK Penduroll gate valve 5. VTEK Twinrollcam gate valve for stocker - L/L interface 6. PM vacuum guages All L/L guages + MKS capacitance Manomenter 7. L/L Vacuum Gauges Ulvac G-Tan SH2 ion gauge Ulvac G-Tan SPI pirani guage sensor SMC ZSE80F-A2-R-M REMOTE VACUUM: 8. Edwards iXL 1000N 9. C30FX cryo compressor (both shared L/L, PM) PROCESS SIDE: 10. STEC Ar mfc (200sccm) 11. STEC O2 mfc (5 sccm) 12. VTEK Twinrollcam gate valve for L/L-PM interface 13. Rf Magnatron with variable speed moving magnet - A/E Pinacles Plus 5kW 13.56 Rf generator (not shown as housed in PDCU) 14. A/E Rf match.