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LAM RESEARCH CORPORATION 2300 VERSYS KIYO
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
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    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

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    検証済み

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    RIE

    最終検証: 30日以上前

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    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    102313


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明

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    Money Back Guarantee
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    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    RIE
    ヴィンテージ: 2006状態: 部品ツール
    最終確認60日以上前

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    verified-listing-icon
    検証済み
    カテゴリ
    RIE
    最終検証: 30日以上前
    listing-photo-9e58ad8627f94c9b9058db45e567fa80-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    102313


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The 2300 Versys Kiyo is a manufacturing tool designed for 65 nm and beyond. It provides excellent uniformity and defect control on a reliable wafer transport system. The symmetric chamber and radial tuning features produce uniform etch results for advanced devices. It employs proprietary technology for process repeatability, low defect, and metal contamination results. It supports conventional applications such as gate and shallow trench isolation (STI) and emerging applications such as high k dielectric removal, critical spacer etch, and lithography-enabling etch steps. The system can be upgraded from the 2300 Versys Star, providing an investment-extending strategy.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    RIEヴィンテージ: 2006状態: 部品ツール最終検証: 60日以上前
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    RIEヴィンテージ: 0状態: 中古最終検証: 26日前
    LAM RESEARCH CORPORATION 2300 VERSYS KIYO

    LAM RESEARCH CORPORATION

    2300 VERSYS KIYO

    RIEヴィンテージ: 0状態: 中古最終検証: 30日以上前