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LAM RESEARCH CORPORATION TCP 9600SE
    説明
    説明なし
    構成
    ETCH
    OEMモデルの説明
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
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    ドキュメントなし

    LAM RESEARCH CORPORATION

    TCP 9600SE

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    検証済み

    カテゴリ

    RIE
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    83906


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明

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    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600SE
    LAM RESEARCH CORPORATIONTCP 9600SERIE
    ヴィンテージ: 0状態: 改修済み
    最終確認60日以上前

    LAM RESEARCH CORPORATION

    TCP 9600SE

    verified-listing-icon

    検証済み

    カテゴリ

    RIE
    最終検証: 60日以上前
    listing-photo-b0c6c90f81744a55b8f88997f9ed77fd-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    83906


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    ETCH
    OEMモデルの説明
    The TCP 9600SE is a high density, low pressure etch system from Lam’s TCP product line. It incorporates the Company’s patented Transformer Coupled Plasma source technology for etching 0.35 micron and smaller geometries. It is used for metal etch applications and is designed to offer customers a reliable, lower cost of ownership solution to their advanced needs. The system operates at lower pressures for improved pattern transfer control and higher plasma density for higher etch rates. It is available as a stand-alone, single wafer tool, or on the Alliance multichamber cluster platform.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION TCP 9600SE
    LAM RESEARCH CORPORATION
    TCP 9600SE
    RIEヴィンテージ: 0状態: 改修済み最終検証: 60日以上前
    LAM RESEARCH CORPORATION TCP 9600SE
    LAM RESEARCH CORPORATION
    TCP 9600SE
    RIEヴィンテージ: 0状態: 改修済み最終検証: 60日以上前
    LAM RESEARCH CORPORATION TCP 9600SE
    LAM RESEARCH CORPORATION
    TCP 9600SE
    RIEヴィンテージ: 0状態: 中古最終検証: 30日以上前