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ALLWIN21 / AG ASSOCIATES AccuThermo AW810M
    説明
    Wafer sizes: Small pieces, 2″, 3″, 4″, 5″, 6″, 8″ wafer capability Recommended ramp up rate: Programmable, 10°C to 120°C per second. Maximum Rate: 200°C (NOT RECOMMENDED) Recommended steady state duration: 0-300 seconds per step. Ramp down rate: Non-programmable, 10°C to 200°C per second. Recommended steady state temperature range: 150°C – 1150°C. Maximum 1250°C (NOT RECOMMENDED) ERP Pyrometer 450-1250°C with ±1°C accuracy when calibrated against an instrumented thermocouple wafer. Thermocouple 100-800°C with ±0.5°C accuracy & rapid response. Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer. (Repetition specifications are based on a 100-wafer set.) Temperature uniformity: ±8°C across an 8″ (200 mm) wafer at 1150°C. (This is a one sigma deviation 100 angstrom oxide.) For a titanium silicide process, no more than 6% increase in non-uniformity during the first anneal at 650°C to 700°C. Process/Purge gas inputs: Any inert and/or non-toxic gas regulated to 30 PSIG and pre-filtered to 1 micron. Typically, N2, O2), Ar, He, forming gas, NH3, N2O2 are used.
    構成
    Quartz tray for 8inch x 8 inch now. Optional for 5-8 inch round wafer ERP Pyrometer for 450-1250C Gases: N2 and O2. AccuThermo AW 810M Main Frame with wires. Power Type: Three Phase, worldwide power (50/60 Hz) CE Mark if Necessary Pentium® class computer with a 17-inch LCD monitor and Allwin21 Corp proprietary software package. Mouse and standard keyboard. Aluminum oven chamber with water cooling passages and gold plating plates. Door plate with one TC connection port. Isolated Quartz Tube W/O Pyrometer window or with Pyrometer Window. Oven control board and one main control board. Bottom and top heating with 27 (1.2KW ea) Radiation heating lamp module with 4 bank zones (Top Front&Rear, Bottom Front&Rear). Quartz Tray for 5 to 8 inch round wafer or customized. Gas line with one Gas MFC with shut-off valve T-Shape Quartz with qualified K-Type TC and one set holder for 100-800°C temperature measurement. Package of 5 pieces of thermocouple wires as spare TC. USB with original Software backup
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    RTP/RTA

    最終検証: 29日前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    138661


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm


    ヴィンテージ:

    2011


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ALLWIN21 / AG ASSOCIATES AccuThermo AW810M

    ALLWIN21 / AG ASSOCIATES

    AccuThermo AW810M

    RTP/RTA
    ヴィンテージ: 2021状態: 中古
    最終確認60日以上前

    ALLWIN21 / AG ASSOCIATES

    AccuThermo AW810M

    verified-listing-icon
    検証済み
    カテゴリ
    RTP/RTA
    最終検証: 29日前
    listing-photo-0125965e136a49c3ba160fa43f4712e2-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2186/0125965e136a49c3ba160fa43f4712e2/151c8fa9547f40a0b5a0598e9aca1ef6_accuthermoaw810mrapidthermalprocessor768x437_mw.jpg
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    138661


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm


    ヴィンテージ:

    2011


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Wafer sizes: Small pieces, 2″, 3″, 4″, 5″, 6″, 8″ wafer capability Recommended ramp up rate: Programmable, 10°C to 120°C per second. Maximum Rate: 200°C (NOT RECOMMENDED) Recommended steady state duration: 0-300 seconds per step. Ramp down rate: Non-programmable, 10°C to 200°C per second. Recommended steady state temperature range: 150°C – 1150°C. Maximum 1250°C (NOT RECOMMENDED) ERP Pyrometer 450-1250°C with ±1°C accuracy when calibrated against an instrumented thermocouple wafer. Thermocouple 100-800°C with ±0.5°C accuracy & rapid response. Temperature repeatability: ±0.5°C or better at 1150°C wafer-to-wafer. (Repetition specifications are based on a 100-wafer set.) Temperature uniformity: ±8°C across an 8″ (200 mm) wafer at 1150°C. (This is a one sigma deviation 100 angstrom oxide.) For a titanium silicide process, no more than 6% increase in non-uniformity during the first anneal at 650°C to 700°C. Process/Purge gas inputs: Any inert and/or non-toxic gas regulated to 30 PSIG and pre-filtered to 1 micron. Typically, N2, O2), Ar, He, forming gas, NH3, N2O2 are used.
    構成
    Quartz tray for 8inch x 8 inch now. Optional for 5-8 inch round wafer ERP Pyrometer for 450-1250C Gases: N2 and O2. AccuThermo AW 810M Main Frame with wires. Power Type: Three Phase, worldwide power (50/60 Hz) CE Mark if Necessary Pentium® class computer with a 17-inch LCD monitor and Allwin21 Corp proprietary software package. Mouse and standard keyboard. Aluminum oven chamber with water cooling passages and gold plating plates. Door plate with one TC connection port. Isolated Quartz Tube W/O Pyrometer window or with Pyrometer Window. Oven control board and one main control board. Bottom and top heating with 27 (1.2KW ea) Radiation heating lamp module with 4 bank zones (Top Front&Rear, Bottom Front&Rear). Quartz Tray for 5 to 8 inch round wafer or customized. Gas line with one Gas MFC with shut-off valve T-Shape Quartz with qualified K-Type TC and one set holder for 100-800°C temperature measurement. Package of 5 pieces of thermocouple wires as spare TC. USB with original Software backup
    OEMモデルの説明
    提供なし
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ALLWIN21 / AG ASSOCIATES AccuThermo AW810M

    ALLWIN21 / AG ASSOCIATES

    AccuThermo AW810M

    RTP/RTAヴィンテージ: 2021状態: 中古最終検証:60日以上前
    ALLWIN21 / AG ASSOCIATES AccuThermo AW810M

    ALLWIN21 / AG ASSOCIATES

    AccuThermo AW810M

    RTP/RTAヴィンテージ: 2011状態: 改修済み最終検証:29日前