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APPLIED MATERIALS (AMAT) CENTURA RTP XE
    説明
    Lamp annealer
    構成
    構成なし
    OEMモデルの説明
    The Centura RTP XE is a Rapid Thermal Processing system introduced in 1997. It features improved productivity, higher throughput, and reduced power consumption. It also includes the TempMatchTM temperature calibration tool for precise temperature matching among multiple chambers and systems. New applications include In-Situ Steam Generation, Nitric Oxide nitridation for gate dielectrics, and BPSG reflow capability. The system is available for both 200mm and 300mm applications, delivering process uniformity for 0.18mm devices and slip-free results up to 1100°C at a rate of 100°C/sec.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    RTP/RTA

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    130672


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA RTP XE

    APPLIED MATERIALS (AMAT)

    CENTURA RTP XE

    RTP/RTA
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    APPLIED MATERIALS (AMAT)

    CENTURA RTP XE

    verified-listing-icon
    検証済み
    カテゴリ
    RTP/RTA
    最終検証: 60日以上前
    listing-photo-e9ae8f40e0b74d2c8d7c84df53f10975-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    130672


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Lamp annealer
    構成
    構成なし
    OEMモデルの説明
    The Centura RTP XE is a Rapid Thermal Processing system introduced in 1997. It features improved productivity, higher throughput, and reduced power consumption. It also includes the TempMatchTM temperature calibration tool for precise temperature matching among multiple chambers and systems. New applications include In-Situ Steam Generation, Nitric Oxide nitridation for gate dielectrics, and BPSG reflow capability. The system is available for both 200mm and 300mm applications, delivering process uniformity for 0.18mm devices and slip-free results up to 1100°C at a rate of 100°C/sec.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    APPLIED MATERIALS (AMAT) CENTURA RTP XE

    APPLIED MATERIALS (AMAT)

    CENTURA RTP XE

    RTP/RTAヴィンテージ: 0状態: 中古最終検証:60日以上前
    APPLIED MATERIALS (AMAT) CENTURA RTP XE

    APPLIED MATERIALS (AMAT)

    CENTURA RTP XE

    RTP/RTAヴィンテージ: 0状態: 中古最終検証:60日以上前