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ANNEALSYS AS-One
    説明
    The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.
    構成
    構成なし
    OEMモデルの説明
    The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    RTP/RTA

    最終検証: 18日前

    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    138663


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ANNEALSYS AS-One

    ANNEALSYS

    AS-One

    RTP/RTA
    ヴィンテージ: 0状態: 改修済み
    最終確認18日前

    ANNEALSYS

    AS-One

    verified-listing-icon
    検証済み
    カテゴリ
    RTP/RTA
    最終検証: 18日前
    listing-photo-c36f30e1cccf499d909f54679ec8f062-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/2186/c36f30e1cccf499d909f54679ec8f062/9cae25c345dd470c854a6f9ffd7d03d5_annealsysasonerapidthermalprocessingequipment_mw.jpeg
    主なアイテムの詳細

    状態:

    Refurbished


    稼働ステータス:

    不明


    製品ID:

    138663


    ウェーハサイズ:

    2"/50mm, 3"/75mm, 4"/100mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    The AS-One is a versatile RTP system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. Rapid thermal annealing (RTA) Implant annealing Ohmic contact annealing (III-V and SiC) Rapid Thermal Oxidation (RTO) Rapid Thermal Nitridation (RTN) Selenization (CIGS solar cells) CVD of graphene and h-BN (hexagonal boron nitride) Thermal annealing of polymers Etc.
    構成
    構成なし
    OEMモデルの説明
    The Annealsys AS-One is a system that can be used for the development of rapid thermal annealing and rapid thermal CVD processes. It is a versatile system that can perform various processes such as rapid thermal annealing (RTA), implant annealing, ohmic contact annealing, rapid thermal oxidation (RTO), rapid thermal nitridation (RTN), selenization, and CVD of graphene and h-BN (hexagonal boron nitride).
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ANNEALSYS AS-One

    ANNEALSYS

    AS-One

    RTP/RTAヴィンテージ: 0状態: 改修済み最終検証:18日前