説明
Including growth chamber and prep chamber and associated instrument racks. System was under vacuum until March 2021 when it was vented to remove the items described in (3), below. (i) Growth chamber (photos 03-08) (ii) Prep chamber (photos 01-03 and 08-09) (iii) 3-bay instrument racks (photos 10-12) • Items (i) and (ii) are missing many vacuum flanges and viewports, open ports have been covered with aluminum foil following standard UHV practice to avoid contaminating the chamber interior. • Item (1) is missing cryopump and compressor. The 10" gate valve isolating the cryopump from the growth chamber is missing. • The growth stage requires repair, the magnetically coupled rotary mechanism is non-functional. • Quartz crystal film thickness monitors are missing • 4 Knudsen cells attached to growth chamber shown in photos 01, 02 & 04. • 1 single-pocket (photos 07 & 08) and 1 double-pocket (photos 04-06) electron beam deposition sources attached to system on 14" wire seal flanges. Thermionics electron beam power supply shown in photo 10. Electron beam sweep controllers shown in photo 10. • 300 L/s varian starcell ion pump (photos 01, 02, 09) attached to prep chamber. Ion pump power supply shown in photo 12. • System was manufactured by SVT Associates and installed in 2002.構成
System was used for SiGe growth. It is configured for 4" diameter wafers. • System does not include load lock or linear transfer mechanism for loading wafers into growth stage.OEMモデルの説明
提供なしドキュメント
ドキュメントなし
SVT Associates
Group IV
検証済み
カテゴリ
RTP/RTA
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
39651
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
SVT Associates
Group IV
カテゴリ
RTP/RTA
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
39651
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Including growth chamber and prep chamber and associated instrument racks. System was under vacuum until March 2021 when it was vented to remove the items described in (3), below. (i) Growth chamber (photos 03-08) (ii) Prep chamber (photos 01-03 and 08-09) (iii) 3-bay instrument racks (photos 10-12) • Items (i) and (ii) are missing many vacuum flanges and viewports, open ports have been covered with aluminum foil following standard UHV practice to avoid contaminating the chamber interior. • Item (1) is missing cryopump and compressor. The 10" gate valve isolating the cryopump from the growth chamber is missing. • The growth stage requires repair, the magnetically coupled rotary mechanism is non-functional. • Quartz crystal film thickness monitors are missing • 4 Knudsen cells attached to growth chamber shown in photos 01, 02 & 04. • 1 single-pocket (photos 07 & 08) and 1 double-pocket (photos 04-06) electron beam deposition sources attached to system on 14" wire seal flanges. Thermionics electron beam power supply shown in photo 10. Electron beam sweep controllers shown in photo 10. • 300 L/s varian starcell ion pump (photos 01, 02, 09) attached to prep chamber. Ion pump power supply shown in photo 12. • System was manufactured by SVT Associates and installed in 2002.構成
System was used for SiGe growth. It is configured for 4" diameter wafers. • System does not include load lock or linear transfer mechanism for loading wafers into growth stage.OEMモデルの説明
提供なしドキュメント
ドキュメントなし