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説明
FEI, FIB200 Ion Column: Magnum • i-Source: Ga LMIS • kV: 30kV, • Bc: 21nA Detectors • In chamber: (CDEM) Continuous Diode Electron Multiplier for ion imaging Chamber & Stage • Sample load: Front door 5-axes motorized stage, manual eucentric tilt will be supplied • XYZ: 50 x 50 x 10mm, T: -20 +60, R: n x 360 • Ports for analytical or probing applications • In Chamber CCD Gas Injection System (GIS) • Max 2 GIS • 1 GIS Pt and EE included Microscope Control windows NT 4.0 Vacuum System • Modes: 1 IGP pump • Pumps: vacuum pump Ancillary Equipment • Air: house or compressor REQUIRED, Included "Used/Tested" • Nitrogen: OPTIONAL, Customer provides構成
This is currently working online, configured as: magnum column, 2GIS: EE, PT, CDEM, stage: 5-axis, Windows NT 4.0OEMモデルの説明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.ドキュメント
ドキュメントなし
カテゴリ
SEM / FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
87170
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILLIPS
FIB 200
カテゴリ
SEM / FIB
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
87170
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
FEI, FIB200 Ion Column: Magnum • i-Source: Ga LMIS • kV: 30kV, • Bc: 21nA Detectors • In chamber: (CDEM) Continuous Diode Electron Multiplier for ion imaging Chamber & Stage • Sample load: Front door 5-axes motorized stage, manual eucentric tilt will be supplied • XYZ: 50 x 50 x 10mm, T: -20 +60, R: n x 360 • Ports for analytical or probing applications • In Chamber CCD Gas Injection System (GIS) • Max 2 GIS • 1 GIS Pt and EE included Microscope Control windows NT 4.0 Vacuum System • Modes: 1 IGP pump • Pumps: vacuum pump Ancillary Equipment • Air: house or compressor REQUIRED, Included "Used/Tested" • Nitrogen: OPTIONAL, Customer provides構成
This is currently working online, configured as: magnum column, 2GIS: EE, PT, CDEM, stage: 5-axis, Windows NT 4.0OEMモデルの説明
The FEI FIB 200 is a type of Focused Ion Beam (FIB) system that has many uses, such as editing circuits, analyzing defects and failures, preparing TEM lamella, fabricating nanostructures, prototyping at the nanoscale, and working with MEMS. There are a few different models of the FEI FIB 200, including the FEI FIB 200-M and the FEI FIB 200-P. The FEI FIB 200-M model features a Magnum ion column that provides twice the milling power of earlier pre-lens FIB columns. It also has a voltage range of 5-30kV for its Magnum column, a beam current of 21nA for milling power, and CDEM for ion and electron imaging with a resolution of 7nm. The FEI FIB 200-P model, on the other hand, uses a pre-lens ion column.ドキュメント
ドキュメントなし