説明
Additional Options Additional MultiChem GIS chemistries: IEE, EE, Pt, W, C Integrated EDS and EBSD detectors構成
Helios 450HP (upgraded to a G3 system) Elstar UC Electron Column Electron beam range: 350 V to 30 kV Tomahawk Ion Column Ion beam voltage: 0.5 to 30 kV Beam current: 1 pA to 65 nA TLD, ETD, and ICE detectors EasyLift with rotation MultiChem GIS with Pt or W included Integrated plasma cleaner Full Piezo UHR stage Windows 7 and XT 10 Installation and operation training includedOEMモデルの説明
The 450HP and 1200HP DualBeam systems include new capability that meets the critical requirements for semiconductor process development at the 28nm device geometry node and below. The 450HP model can accommodate samples up to 100mm wafers.ドキュメント
ドキュメントなし
カテゴリ
SEM / FIB
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150314
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
THERMOFISHER SCIENTIFIC / FEI / PHILIPS
HELIOS NANOLAB 450HP
カテゴリ
SEM / FIB
最終検証： 15日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
150314
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Additional Options Additional MultiChem GIS chemistries: IEE, EE, Pt, W, C Integrated EDS and EBSD detectors構成
Helios 450HP (upgraded to a G3 system) Elstar UC Electron Column Electron beam range: 350 V to 30 kV Tomahawk Ion Column Ion beam voltage: 0.5 to 30 kV Beam current: 1 pA to 65 nA TLD, ETD, and ICE detectors EasyLift with rotation MultiChem GIS with Pt or W included Integrated plasma cleaner Full Piezo UHR stage Windows 7 and XT 10 Installation and operation training includedOEMモデルの説明
The 450HP and 1200HP DualBeam systems include new capability that meets the critical requirements for semiconductor process development at the 28nm device geometry node and below. The 450HP model can accommodate samples up to 100mm wafers.ドキュメント
ドキュメントなし