Under service contract since installation in 2004

ZEISS is the global technology leader in the production of systems and modules for microchip production. With semiconductor manufacturing optics, photomask systems and process control solutions, ZEISS supplies key technologies for the production of ultra-fine conductor track structures on silicon wafers – the raw material used to make microchips. Advances in computer technology largely rely on the ongoing development of optical lithography – every new generation enables even finer structures to be produced on the microchips. This makes circuits more compact, resulting in more powerful and more energy-efficient microchips every year. ZEISS has been driving the development of semiconductor manufacturing technology right from day one. ZEISS’ new and unique extreme ultraviolet (EUV) lithography has created a series of further generations of microchips with ever greater integration density and performance.

ZEISS / CARL ZEISS

The SUPRA® 55VP is a high-resolution scanning electron microscope that features proprietary VP (variable pressure) technology for the GEMINI® column. This technology enables direct imaging of non-conductive or delicate specimens without the need for complicated sample preparation techniques. The VP technology is also available on the SUPRA® 40 VP and SUPRA® 60 VP. The operation of high vacuum mode or variable pressure mode can be easily selected with a simple mouse click. The SUPRA® 55VP offers the highest resolution available today, comparable with “in-lens instruments”, combined with a superb large fully eucentric 5” stage and a large multi-functional specimen chamber. It has been designed for the most demanding applications in nanotechnology, with sub-nm resolution readily attainable. This makes the SUPRA® 55VP a versatile and user-friendly tool for a wide range of applications.

SUPRA 55VP

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ZEISS / CARL ZEISS

SUPRA 55VP

SEM / FIB

同様のリスト

ZEISS / CARL ZEISS

SUPRA 55VP

SUPRA 55VP

SEM / FIB

同様のリスト

ZEISS / CARL ZEISS

SUPRA 55VP