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説明
説明なし構成
構成なしOEMモデルの説明
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
120535
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/300C
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
120535
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The PAS 5500/300C is a DUV wafer stepper made by ASML. It is part of the PAS 5500 platform, which has been a ground-breaking lithography platform for ASML and has been in use for over 30 years. The PAS 5500/300C is a step and repeat exposure system with laser-controlled stage motion. It uses a Zeiss lens with a variable N.A. of 0.63 - 0.40 and a DUV (248 nm) exposure wavelength. It has programmable annular illumination modes and a field size of 22 x 22 mm. It also has 3D-Align backside alignment.ドキュメント
ドキュメントなし