説明
Parts Current Status: REMA housing (missing REMA unit, board, and lamp) WTS (missing Gripper ASSY) Reticle Table Projection Lens Main plate WS stone Main body and auxiliary machine frames Machine Cover構成
構成なしOEMモデルの説明
"The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. The stepper uses 5X reduction imaging allowing a maximum die area of 18mm by 22.4mm per exposure. The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500 platform marks a great step forward from the PAS 2500/5000 in terms of imaging and throughput capabilities The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.ドキュメント
ドキュメントなし
検証済み
カテゴリ
Steppers & Scanners
最終検証： 20日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled / Palletized
製品ID：
142917
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/60
カテゴリ
Steppers & Scanners
最終検証： 20日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Deinstalled / Palletized
製品ID：
142917
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Parts Current Status: REMA housing (missing REMA unit, board, and lamp) WTS (missing Gripper ASSY) Reticle Table Projection Lens Main plate WS stone Main body and auxiliary machine frames Machine Cover構成
構成なしOEMモデルの説明
"The ASML PAS 5500/60 stepper is an i-line system with automatic 100mm wafer cassette processing capability. Using 365nm near-UV light this stepper is capable of a minimum feature size of 450nm and alignment between lithographic layers of 90nm. The stepper uses 5X reduction imaging allowing a maximum die area of 18mm by 22.4mm per exposure. The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.The “60” is the first system of the PAS 200mm wafer-capable 5500 family of steppers and scanners. The PAS 5500 platform marks a great step forward from the PAS 2500/5000 in terms of imaging and throughput capabilities The PAS 5500/60 is a sub-half-micron i-line stepper delivering throughputs up to 48 200-mm wafers per hour while meeting design rules down to 0.45 micron.ドキュメント
ドキュメントなし