説明
PAS 5500 Stepper 700D with /750 lens構成
248nm (KrF) ScannerOEMモデルの説明
"PAS 5500/700 is a Wafer Steppers System that proceses a wafer size of 3” to 8”. The equipment is a fully automated wafer handling system of 2” with holder capability.The PAS 5500/700 DUV Step & Scan system combines the imaging power of a high numerical aperture (0.7 NA) 4X reduction lens with the latest innovation in illumination technology, the AERIAL II™ Illuminator, to extend KrF lithography down to 150nm. Utilizing ASML's PAS 5500 system architecture and high speed scanning stages, the /700D provides long-term single machine overlay of less than 35nm. The /700D is equipped with a 2KHz, 20W KrF laser, which enables production throughputs of more than 120 200-mm wafers per hour at doses up to 50 mJ/cm2. The system is equipped with ASML's proven PGA (Phase Grating Alignment) system, and the new ATHENA™ advanced alignment system for improved alignment accuracy on backend process layers including CM processes. The PAS 5500/700 is the ideal system for high volume production of 150 nm design rule IC's."ドキュメント
ドキュメントなし
検証済み
カテゴリ
Steppers & Scanners
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146846
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/700
カテゴリ
Steppers & Scanners
最終検証： 2日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
146846
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
PAS 5500 Stepper 700D with /750 lens構成
248nm (KrF) ScannerOEMモデルの説明
"PAS 5500/700 is a Wafer Steppers System that proceses a wafer size of 3” to 8”. The equipment is a fully automated wafer handling system of 2” with holder capability.The PAS 5500/700 DUV Step & Scan system combines the imaging power of a high numerical aperture (0.7 NA) 4X reduction lens with the latest innovation in illumination technology, the AERIAL II™ Illuminator, to extend KrF lithography down to 150nm. Utilizing ASML's PAS 5500 system architecture and high speed scanning stages, the /700D provides long-term single machine overlay of less than 35nm. The /700D is equipped with a 2KHz, 20W KrF laser, which enables production throughputs of more than 120 200-mm wafers per hour at doses up to 50 mJ/cm2. The system is equipped with ASML's proven PGA (Phase Grating Alignment) system, and the new ATHENA™ advanced alignment system for improved alignment accuracy on backend process layers including CM processes. The PAS 5500/700 is the ideal system for high volume production of 150 nm design rule IC's."ドキュメント
ドキュメントなし