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ASML TWINSCAN AT:1150C
    説明
    説明なし
    構成
    -ARF Scanners, 12" -193nm
    OEMモデルの説明
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
    ドキュメント

    ドキュメントなし

    ASML

    TWINSCAN AT:1150C

    verified-listing-icon

    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    65726


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    Steppers & Scanners
    ヴィンテージ: 0状態: 中古
    最終確認60日以上前

    ASML

    TWINSCAN AT:1150C

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 60日以上前
    listing-photo-06fd0190b07d40eba0a142c0c3094dc1-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    65726


    ウェーハサイズ:

    12"/300mm


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    -ARF Scanners, 12" -193nm
    OEMモデルの説明
    The TWINSCAN C product family will be available on four systems: the AT:400C, AT:750C, AT:850C and AT:1150C. The productivity enhancements in TWINSCAN C increase wafer output to over 110 wafers per hour for 300 mm wafers at real production conditions (109 exposures per wafer). The increased stage speeds in the TWINSCAN platform allow for these productivity improvements while maintaining imaging, alignment and leveling accuracy.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ASML TWINSCAN AT:1150C

    ASML

    TWINSCAN AT:1150C

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:60日以上前