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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ASML TWINSCAN XT:1700Fi
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.
    ドキュメント

    ドキュメントなし

    ASML

    TWINSCAN XT:1700Fi

    verified-listing-icon

    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    60718


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ASML TWINSCAN XT:1700Fi

    ASML

    TWINSCAN XT:1700Fi

    Steppers & Scanners
    ヴィンテージ: 2006状態: 中古
    最終確認60日以上前

    ASML

    TWINSCAN XT:1700Fi

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 60日以上前
    listing-photo-4dbae7db52274e5da5faab5423830361-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    60718


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    説明なし
    構成
    構成なし
    OEMモデルの説明
    The TWINSCAN XT:1700Fi is a state-of-the-art, dual-stage immersion lithography tool, specifically engineered for high-volume 300-mm wafer production. It boasts a resolution of 50 nm and below, making it a powerhouse for intricate semiconductor manufacturing. It features a 1.2-NA in-line catadioptric lens, an illuminator with optimized polarization mode, and advanced stage technology. It meets overlay and focus requirements and achieves a throughput of 122 wafers per hour. The tool also includes an extended ultra-k1 package with various enhancements.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ASML TWINSCAN XT:1700Fi

    ASML

    TWINSCAN XT:1700Fi

    Steppers & Scannersヴィンテージ: 2006状態: 中古最終検証:60日以上前
    ASML TWINSCAN XT:1700Fi

    ASML

    TWINSCAN XT:1700Fi

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:60日以上前