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ASML PAS 5500/750F
    説明
    PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -
    構成
    構成なし
    OEMモデルの説明
    DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.
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    ドキュメントなし

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    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 12日前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    149301


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    ASML PAS 5500/750F

    ASML

    PAS 5500/750F

    Steppers & Scanners
    ヴィンテージ: 0状態: 中古
    最終確認12日前

    ASML

    PAS 5500/750F

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 12日前
    listing-photo-4cd51698e3bb4e0e9cf88646ef1f8dad-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    149301


    ウェーハサイズ:

    不明


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -
    構成
    構成なし
    OEMモデルの説明
    DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    ASML PAS 5500/750F

    ASML

    PAS 5500/750F

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:12日前