
説明
PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -構成
構成なしOEMモデルの説明
DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.ドキュメント
ドキュメントなし
カテゴリ
Steppers & Scanners
最終検証: 12日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
149301
ウェーハサイズ:
不明
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ASML
PAS 5500/750F
カテゴリ
Steppers & Scanners
最終検証: 12日前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
149301
ウェーハサイズ:
不明
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
PLXM20 - Sistema de fotolitografia para exposição de lâminas de semicondutores cobertas com polímeros fotossensível usando luz ultravioleta e máscaras (retículos) para a fabricação de circuitos integrados eletrônicos. -構成
構成なしOEMモデルの説明
DUV Step and Scan The PAS 5500/750F DUV Step-and-Scan system enables 130-nm mass production using mature 248-nm KrF technology. It combines the imaging power of the improved 0.7 NA 4x reduction lens with the latest multi-spot innovations in the leveling system and the AERIAL II illumination technology including QUASAR, multipole illumination and optional multiple exposure capability. The system is equipped with both TTL alignment and ATHENA for improved alignment accuracy on backend process layers, providing a long term single machine overlay of less than 25 nm.ドキュメント
ドキュメントなし