説明
説明なし構成
Suitable for variety of wafer types: Silicon, Silicon Carbide, Gallium Nitride, and all other Compound Semi substrates as well as clear wafers. Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 365nm Light Source: 2.0KW Super High Pressure Hg Lamp Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 59 wph (60 shot / 22 mm / 8” Wafer) 83 wph (32 shot / 22 mm / 6" Wafer) illumination data taken in July 2024: Uniformity : 0.921% Intensity : 9,916 w/mOEMモデルの説明
The Canon FPA-3000 i4 is a stepper used in the semiconductor industry. It has a reticle size of 6" square with a thickness of 0.25" and is made of quartz material1. It can handle wafer sizes of 4" through 8" that are SEMI Standard, JEIDA, Notch/Flat. The Canon FPA-3000 i4 has a projection magnification of 1/5 X and a numerical aperture of .45 - .63. The field size is 22x22 17x26 and the exposure light is Kr F (365nm). The estimated throughput of the Canon FPA-3000 i4 is 59 wafers per hour for an 8" wafer with 60 shots and 22 mm field size. For a 6" wafer, it can handle up to 83 wafers per hour with 32 shots and 22 mm field size. The Canon FPA-3000 i4 has an alignment accuracy of less than 0.06 μm (mean + 3 σ). The Canon FPA-3000 i4 has a resolution of 0.35 μm.ドキュメント
ドキュメントなし
CANON
FPA-3000i4
検証済み
カテゴリ
Steppers & Scanners
最終検証： 2日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
117147
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
CANON
FPA-3000i4
カテゴリ
Steppers & Scanners
最終検証： 2日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
117147
ウェーハサイズ：
4"/100mm, 6"/150mm, 8"/200mm
ヴィンテージ：
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Suitable for variety of wafer types: Silicon, Silicon Carbide, Gallium Nitride, and all other Compound Semi substrates as well as clear wafers. Reticle size: 6" Square Field Size: 22 X 22 mm Exposure Light: 365nm Light Source: 2.0KW Super High Pressure Hg Lamp Projection Magnification: 1/5 X Numerical Aperture: 0.63~0.45 Estimated Throughput: 59 wph (60 shot / 22 mm / 8” Wafer) 83 wph (32 shot / 22 mm / 6" Wafer) illumination data taken in July 2024: Uniformity : 0.921% Intensity : 9,916 w/mOEMモデルの説明
The Canon FPA-3000 i4 is a stepper used in the semiconductor industry. It has a reticle size of 6" square with a thickness of 0.25" and is made of quartz material1. It can handle wafer sizes of 4" through 8" that are SEMI Standard, JEIDA, Notch/Flat. The Canon FPA-3000 i4 has a projection magnification of 1/5 X and a numerical aperture of .45 - .63. The field size is 22x22 17x26 and the exposure light is Kr F (365nm). The estimated throughput of the Canon FPA-3000 i4 is 59 wafers per hour for an 8" wafer with 60 shots and 22 mm field size. For a 6" wafer, it can handle up to 83 wafers per hour with 32 shots and 22 mm field size. The Canon FPA-3000 i4 has an alignment accuracy of less than 0.06 μm (mean + 3 σ). The Canon FPA-3000 i4 has a resolution of 0.35 μm.ドキュメント
ドキュメントなし