説明

Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.

構成

0.35 0.45~0.63 5:1 22*26 60

OEMモデルの説明

The FPA-3000i5 is a Fine Pattern Aligner that can write submicron images on a silicon wafer. It has a 0.35 µm lithography and can process 74 wafers per hour. It has a 0.63 NA and uses the latest off-axis illumination technique (SIA II). The FPA-3000i5 has improved lens performance, better wafer edge chip auto-focusing, and increased illumination intensity. It has a small footprint and a multitasking touch screen operation. It is compatible with Canon’s family of lithography steppers.

ドキュメント

ドキュメントなし

CANON

FPA-3000i5

検証済み

カテゴリ

Steppers & Scanners

最終検証： 60日以上前

主なアイテムの詳細

状態：

Used

稼働ステータス:

不明

製品ID：

131680

ウェーハサイズ：

4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm

ヴィンテージ：

不明

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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