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CANON FPA-3000iW
    説明
    Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.
    構成
    0.80 0.24 2:1 50*50 120
    OEMモデルの説明
    The FPA-3000iW is a high-throughput stepper from Canon that provides non-critical layer, 0.80µm level exposure at better than 110 wafers per hour. It has a one shot, 50 mm wide field exposure and is designed to decrease capital equipment Cost-of-Ownership. The FPA-3000iW has a small footprint, is easy to operate, and is compatible with Canon’s family of FPA-3000 steppers. It has a large field i-line lens with 0.8µm resolution accuracy and can expose four 22mm FPA-3000i4/i5/EX3 die areas in a single shot.
    ドキュメント

    ドキュメントなし

    verified-listing-icon

    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131678


    ウェーハサイズ:

    4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    CANON FPA-3000iW

    CANON

    FPA-3000iW

    Steppers & Scanners
    ヴィンテージ: 2000状態: 中古
    最終確認60日以上前

    CANON

    FPA-3000iW

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 60日以上前
    listing-photo-0f2bdebe4ccc4842afad0659d3d323c0-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131678


    ウェーハサイズ:

    4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Canon I-line lithography machine uses a 365nm wavelength light source for exposure. It is a key device for realizing the manufacturing of micron-level semiconductor devices. It has more excellent alignment accuracy and is widely used in the production of 4-inch, 6-inch, 8-inch and 12-inch wafers.
    構成
    0.80 0.24 2:1 50*50 120
    OEMモデルの説明
    The FPA-3000iW is a high-throughput stepper from Canon that provides non-critical layer, 0.80µm level exposure at better than 110 wafers per hour. It has a one shot, 50 mm wide field exposure and is designed to decrease capital equipment Cost-of-Ownership. The FPA-3000iW has a small footprint, is easy to operate, and is compatible with Canon’s family of FPA-3000 steppers. It has a large field i-line lens with 0.8µm resolution accuracy and can expose four 22mm FPA-3000i4/i5/EX3 die areas in a single shot.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    CANON FPA-3000iW

    CANON

    FPA-3000iW

    Steppers & Scannersヴィンテージ: 2000状態: 中古最終検証:60日以上前
    CANON FPA-3000iW

    CANON

    FPA-3000iW

    Steppers & Scannersヴィンテージ: 0状態: 中古最終検証:60日以上前
    CANON FPA-3000iW

    CANON

    FPA-3000iW

    Steppers & Scannersヴィンテージ: 0状態: 改修済み最終検証:60日以上前