説明
説明なし構成
* Minimum substrate size: 10x10 mm * Computer programmable recipes on hdd * Lens: Olympus 2142: NA = 0.42; Depth of field = 1.2 um for 0.7 um process * Maximum die size: ~15 mm x 15 mm * Resolution: 500 nm over portion of field; 700 nm over entire field * Mask Plates: 5x5x0.090 inches, 5x reduction, typically Soda Lime Glass (Quartz is also acceptable), no pellicle. * Registration tolerance: Max 0.30 um global alignment; Max 0.15 um local alignment (with care, you can achieve < 0.10 um registration)OEMモデルの説明
The GCA 6300 DSW steppers have chucks for 3", 100 mm, and 150 mm wafers. Pieces smaller than this can also be used but there is no special chuck for this purpose.ドキュメント
ドキュメントなし
GCA
6300 DWS
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
118004
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
* Minimum substrate size: 10x10 mm * Computer programmable recipes on hdd * Lens: Olympus 2142: NA = 0.42; Depth of field = 1.2 um for 0.7 um process * Maximum die size: ~15 mm x 15 mm * Resolution: 500 nm over portion of field; 700 nm over entire field * Mask Plates: 5x5x0.090 inches, 5x reduction, typically Soda Lime Glass (Quartz is also acceptable), no pellicle. * Registration tolerance: Max 0.30 um global alignment; Max 0.15 um local alignment (with care, you can achieve < 0.10 um registration)OEMモデルの説明
The GCA 6300 DSW steppers have chucks for 3", 100 mm, and 150 mm wafers. Pieces smaller than this can also be used but there is no special chuck for this purpose.ドキュメント
ドキュメントなし