
説明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.構成
0.45 0.57 5:1 20*20 FIA:130 LSA:100OEMモデルの説明
The NSR-2005i10C is a stepper that uses an I-line light source with a wavelength of 365 nanometers. It achieves a resolution of 0.45 micron or better over a wide exposure area of 22mm x 22mm to 17.9mm x 25.2mm. With an optional feature called Shrine (Super High Resolution by Illumination Control), the resolution can be improved to 0.35 micron or better. This stepper is capable of mass-producing 16Mbit DRAMs at its normal resolution of 0.45 micron.ドキュメント
ドキュメントなし
検証済み
カテゴリ
Steppers & Scanners
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
131655
ウェーハサイズ:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示NIKON
NSR-2005i9C
カテゴリ
Steppers & Scanners
最終検証: 60日以上前
主なアイテムの詳細
状態:
Used
稼働ステータス:
不明
製品ID:
131655
ウェーハサイズ:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
ヴィンテージ:
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.構成
0.45 0.57 5:1 20*20 FIA:130 LSA:100OEMモデルの説明
The NSR-2005i10C is a stepper that uses an I-line light source with a wavelength of 365 nanometers. It achieves a resolution of 0.45 micron or better over a wide exposure area of 22mm x 22mm to 17.9mm x 25.2mm. With an optional feature called Shrine (Super High Resolution by Illumination Control), the resolution can be improved to 0.35 micron or better. This stepper is capable of mass-producing 16Mbit DRAMs at its normal resolution of 0.45 micron.ドキュメント
ドキュメントなし