説明
説明なし構成
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEMモデルの説明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.ドキュメント
ドキュメントなし
NIKON
NSR-2205i11D
検証済み
カテゴリ
Steppers & Scanners
最終検証： 9日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
115159
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NIKON
NSR-2205i11D
カテゴリ
Steppers & Scanners
最終検証： 9日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
115159
ウェーハサイズ：
8"/200mm
ヴィンテージ：
1995
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Resolution: 0.35µm Reduction ratio: 1:5 Exposure field: 22mm Alignment accuracy: ≦ 70 nm Wafer size: Currently 8 inch notch- can be converted to any sizeOEMモデルの説明
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.ドキュメント
ドキュメントなし