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NIKON NSR-2205i14E2
    説明
    NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.
    構成
    SA:55 0.35 0.63 5:1 22*22 FIA:65
    OEMモデルの説明
    For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
    ドキュメント

    ドキュメントなし

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    検証済み

    カテゴリ
    Steppers & Scanners

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131660


    ウェーハサイズ:

    2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scanners
    ヴィンテージ: 2007状態: 中古
    最終確認60日以上前

    NIKON

    NSR-2205i14E2

    verified-listing-icon
    検証済み
    カテゴリ
    Steppers & Scanners
    最終検証: 60日以上前
    listing-photo-1d8796fcec344d5b865d24af9d6afc36-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    131660


    ウェーハサイズ:

    2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.
    構成
    SA:55 0.35 0.63 5:1 22*22 FIA:65
    OEMモデルの説明
    For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scannersヴィンテージ: 2007状態: 中古最終検証:60日以上前
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scannersヴィンテージ: 2007状態: 中古最終検証:60日以上前
    NIKON NSR-2205i14E2

    NIKON

    NSR-2205i14E2

    Steppers & Scannersヴィンテージ: 2006状態: 中古最終検証:60日以上前