説明
-Currently installed in demonstration cleanroom in working condition.構成
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEMモデルの説明
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).ドキュメント
ドキュメントなし
NIKON
NSR-2205i14E2
検証済み
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
42825
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
NIKON
NSR-2205i14E2
カテゴリ
Steppers & Scanners
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
42825
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
-Currently installed in demonstration cleanroom in working condition.構成
• High Throughput A New illuminator design, along with a reduced stepping and alignment time, allows a high throughput of 103 wafers per hour (for 200mm wafers). • High Resolution and Modified Illumination The NSR-2205i14E2 with a projection lens with a top N.A. of 0.63 which, taken with modified illumination technology, enables resolution of 0.35μm or better. With Resolution Enhanced Technology (RET) and variable-N.A. reticle design, the systemcan handle a wide range of process parameters and diverse process requirements, including rough and middle layers. • Overall Alignment Accuracy The i14E2’s reticle interferometer system improves alignment accuracy, including chip rotation correction and staging accuracy. Thanks to enhanced baseline measurement and internal chip accuracy (chip magnification, chip rotation),overlay has been significantly improved. • Refined Operation Interface The operation has been enhanced through software improvements. An extensive lineup of measurement evaluation and maintenance software provides the right answer for all your requirements. Specifications Resolution: 0.35μm or better N.A.: 0.63 Exposure light source: i line Reduction ratio:1:5 Exposure field size: 22mm square to 17.9 (H) x 25.2 (V)mm Alignment accuracy (EGA, |x|+3σ):40nm or better Alignment system:LSA(standard), FIA(standard), LIA(optional)OEMモデルの説明
For 350 nm Device Mass Production Thanks to the employment of new, highly enhanced illumination, along with a reduction in stepping and alignment time, the NSR-2205i14E2 features a high throughput of 103 wafers per hour (for 200 mm wafers).ドキュメント
ドキュメントなし