説明
説明なし構成
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEMモデルの説明
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.ドキュメント
ドキュメントなし
NIKON
NSR-SF100
検証済み
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
112206
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-SF100
カテゴリ
Steppers & Scanners
最終検証： 30日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
112206
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
- 6" reticle - Resolution: 0.4um or less - N.A.: 0.5 - Exposed light source: i-line (wavelength = 365nm) - Exposure range: 25x33mm - Alignment accuracy: 45nm or less (M + 3 sigma) - Throughput: 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately) - Reduction ratio: 1:4OEMモデルの説明
The NIKON NSR SF100 is a Steppers and Scanners system. The NSR SF100 can be used with Wafer Size of 8”. The NSR SF100 design predicts the line configuration for 2001 and beyond, and responds with a high throughput of 80 plus wafers/hour on full-scale production lines using 300 mm wafers.ドキュメント
ドキュメントなし