説明

Pellicle Monitoring System

構成

· Used in mask production line · Tool consists of; a pressure-controlled flow bench chamber, an automated SMIF POD factory interface, a toolbox unit, a pellicle gripper assembly, a reticle gripper assembly, a pellicle case loader and a control panel. · A pressure-controlled flow bench chamber: Consists of FFUs to facilitated steady stated down flow stream accompanied by grated flooring at the toolbox level. Exhaust unit enables recirculation of the air back to FFU. · Automated SMIF POD factory interface: Where SMIF POD is loaded to transfer reticles to toolbox unit for pellicle mount or pellicle demount treatment. · Toolbox unit: Consists of four cameras, four pellicle grip manipulator modules (capable of moving along X, Y, Z access to align pellicles with respect to reticles). This is the main unit where facilitates pellicle mount and pellicle demount treatment. · Reticle gripper assembly: Is used to transfer non-pelliclized (or pelliclized in cases of pellicle demount treatment) reticles to toolbox unit (and from toolbox unit back to SMIF POD factory interface). · Pellicle gripper assembly: Is used to transfer pellicles from pellicle case loader to toolbox unit (or from toolbox to pellicle case loader in case of pellicle demount treatment) for pellicle mount treatment. · Pellicle case loader: Where pellicle case is secured using four side case grippers, enabling opening, and closing pellicle cases (for pellicles transfer). · Control panel: Facilitates software interface to navigate through pellicle mount and pellicle demount sequences (start/end process). · Semi-automated tool, where operator performs pellicle and reticle movement to toolbox prior to pellicle mount or demount processes. Operator then sends pellicle mount (or pellicle demount) command through control panel to initiate the process.