説明
説明なし構成
This system is configured with a low volume load lock mounted on top of the process chamber. The load lock consists of a gate valve, adapter flange and motorized linear motion assembly. The 7 .5″ substrate table assembry is mounted within this low volume adapter. Two of the three cathodes are configured for RF magnetron co-sputtering and the third cathode is configured for DC magnetron sputtering. The system has one 7″ diameter rotating substrate stage capable of 5 to 100 RPM, and the stage has 300 watt RF biasing capability. This can also be used for etching the substrate. The system is configured for downmeam pressure control. The software program will run a complete recipe automatically, giving the customer a repeatable process every time.OEMモデルの説明
提供なしドキュメント
カテゴリ
Thermal Evaporators
最終検証： 20日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138431
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
FERROTEC / TEMESCAL
BJD 1800
カテゴリ
Thermal Evaporators
最終検証： 20日前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
138431
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available