説明
Four-pocket gun in the photo has not been rebuilt yet. INSTALL REQUIREMENTS: 100 amps 3 ph (proper grounding very important) Water cooling 80 psi clean dry air N2 for backfill (speeds up pump down time)構成
4 POCKET ELECTRON BEAM GUN CHA SR10 ELECTRON BEAM POWER SUPPLY AUTOTECH II VALVE CONTROLLER CTI 8 CRYOPUMP CTI COMPRESSOROEMモデルの説明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.ドキュメント
ドキュメントなし
CHA
MARK 40
検証済み
カテゴリ
Thermal Evaporators
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
60982
ウェーハサイズ：
不明
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
CHA
MARK 40
カテゴリ
Thermal Evaporators
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
60982
ウェーハサイズ：
不明
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Four-pocket gun in the photo has not been rebuilt yet. INSTALL REQUIREMENTS: 100 amps 3 ph (proper grounding very important) Water cooling 80 psi clean dry air N2 for backfill (speeds up pump down time)構成
4 POCKET ELECTRON BEAM GUN CHA SR10 ELECTRON BEAM POWER SUPPLY AUTOTECH II VALVE CONTROLLER CTI 8 CRYOPUMP CTI COMPRESSOROEMモデルの説明
The CHA MARK 40 is a highly efficient and flexible vacuum deposition system that supports dual operation, including sputtering and evaporation processes. It is designed to handle moving substrates, allowing for continuous and precise deposition of thin films on various materials. The system offers exceptional film uniformity, although the results may depend on the specific fixture used.ドキュメント
ドキュメントなし