説明
Equipment specification: -Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. -Evaporation source : EGN-4020_40ml x 20 pockets). -EB power supply : HPS- 1000N-100( 10 kw). -Internal Jig : Revolution system. -Substrate holder : 6 inch x 25 pcs. -Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200__Max 300_. -Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). - Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)構成
【Equipment specification】●Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. ●Evaporation source : EGN-4020（40ml x 20 pockets). ●EB power supply : HPS- 1000N-100( 10 kw). ●Internal Jig : Revolution system. ●Substrate holder : φ6 inch x 25 pcs. ●Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200℃、Max 300℃. ●Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). ● Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)OEMモデルの説明
Batch Type System Various evaporation sources can be loaded. (EB, RH, EB + RH) Substrate size: φ2 to 6 inch Supports rectangular, Si, compounds, glass and ceramics substratesドキュメント
ドキュメントなし
ULVAC
EI-7L
検証済み
カテゴリ
Thermal Evaporators
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
51531
ウェーハサイズ：
不明
ヴィンテージ：
1905
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULVAC
EI-7L
検証済み
カテゴリ
Thermal Evaporators
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
51531
ウェーハサイズ：
不明
ヴィンテージ：
1905
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Equipment specification: -Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. -Evaporation source : EGN-4020_40ml x 20 pockets). -EB power supply : HPS- 1000N-100( 10 kw). -Internal Jig : Revolution system. -Substrate holder : 6 inch x 25 pcs. -Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200__Max 300_. -Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). - Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)構成
【Equipment specification】●Equipment specification : Auto Loader System(EFEM), Wafer transfer system, Load-lock chamber, Process chamber, Control operation panel, Dry pump, Cryo pump. ●Evaporation source : EGN-4020（40ml x 20 pockets). ●EB power supply : HPS- 1000N-100( 10 kw). ●Internal Jig : Revolution system. ●Substrate holder : φ6 inch x 25 pcs. ●Substrate heating : Infrared lamp heater unit (700W x 2) regular use 200℃、Max 300℃. ●Exhaust system : Dry pump(PS1802-AN_200V_60Hz), Cryo pump(CRYO-U20P). ● Evaporation material : metal ( Al, Ni, Ti, Pt, Au and others)OEMモデルの説明
Batch Type System Various evaporation sources can be loaded. (EB, RH, EB + RH) Substrate size: φ2 to 6 inch Supports rectangular, Si, compounds, glass and ceramics substratesドキュメント
ドキュメントなし