説明
説明なし構成
Film Thickness MeasurementOEMモデルの説明
The Atlas II+ is an advanced Optical CD (OCD) Metrology System developed by Nanometrics. It is designed for high-performance process control metrology and incorporates innovations in optical components, precision wafer positioning, and new software analysis. The system is capable of measuring the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. It also provides unprecedented stability in focus performance and can measure a range of structures, including asymmetric spacers and 3-D gratings. The Atlas II+ is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with spectroscopic reflectometer (SR) and spectroscopic ellipsometer (SE) metrology modules. It also offers a doubling of wafer throughput and an order of magnitude improvement in wafer positioning precision, enabling significant increases in data volume and lowering the system’s cost of ownership. Additionally, it can be optionally equipped with NanoCD Suite for OCD and wafer stress/bow measurement capabilities.ドキュメント
ドキュメントなし
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
98251
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS II+
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
98251
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Film Thickness MeasurementOEMモデルの説明
The Atlas II+ is an advanced Optical CD (OCD) Metrology System developed by Nanometrics. It is designed for high-performance process control metrology and incorporates innovations in optical components, precision wafer positioning, and new software analysis. The system is capable of measuring the smallest semiconductor design features, including complex device structures at 1x nm technology nodes. It also provides unprecedented stability in focus performance and can measure a range of structures, including asymmetric spacers and 3-D gratings. The Atlas II+ is compatible with Nanometrics’ Lynx cluster metrology platform and can be configured with spectroscopic reflectometer (SR) and spectroscopic ellipsometer (SE) metrology modules. It also offers a doubling of wafer throughput and an order of magnitude improvement in wafer positioning precision, enabling significant increases in data volume and lowering the system’s cost of ownership. Additionally, it can be optionally equipped with NanoCD Suite for OCD and wafer stress/bow measurement capabilities.ドキュメント
ドキュメントなし