概要（Overview）

A non-contact, corona-based silicon and oxide charge monitoring system configured for wafer-to-wafer cassette handling of 200 mm wafers. System measures electrical characteristics such as charge composition, interface quality, dielectric thickness, and charge contamination of semiconductors and dielectric films. Measurements performed with easy to use Windows NT-based software interface. An Offline Recipe Generator and Data Analysis package provides added remote recipe generation and data analysis capabilities.