説明
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement構成
Factory Interface - FOUP - Quantity- 2 Handler System - ASYST S3OEMモデルの説明
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.ドキュメント
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KLA
ASET-F5x
カテゴリ
Thin Film / Film Thickness
最終検証： 11日前
主なアイテムの詳細
状態：
Used
稼働ステータス:
Installed / Running
製品ID：
150567
ウェーハサイズ：
12"/300mm
ヴィンテージ：
2008
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Software Version - Summit 4.9 CIM - SECs/GEM Process - Thickness Film Measurement構成
Factory Interface - FOUP - Quantity- 2 Handler System - ASYST S3OEMモデルの説明
The ASET-F5x is a thin film metrology system that can measure materials across a continuous wavelength spectrum from 190 nm to 800 nm. It accurately measures complex multi-layer thin film stacks using spectroscopic ellipsometry and precisely measures advanced, ultra-thin gate dielectric films. It provides the accuracy, repeatability, and system-to-system matching required to monitor advanced ICs with geometries as small as 0.1 micron. Its applications include diffusion films/film deposition, CMP, lithography, and etch.ドキュメント
ドキュメントなし