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説明
*.Installed in a clean room and can demonstrate any time.構成
*.Measurement -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 mE-1(radius=10,000 meters) -Resolution:0.00003mE-1(33 kilometers) -Min scan setp: 0.02mm -Max Points Per Scan: 1250 -Min Radius: 2.0m(for 80mm scan length) -Temperature Range: room temperature ~ 500 C *.Light Source: 670nm(3mW), 750nm(3mW) Laser. *.Dimension: 46cm(18")x46cm(18")x56cm(22") plus computer. *.Weight: 45.5Kg *.Utility -Operation temperature: 18~22 C(64~72F) -Gas Connection: Cooling gas(Nitrogen, Class 100 Air) -Power: 115V, 11A, 50/60Hz -Computer: Pentium 200Mhz,32MB RAM, 3GB HDD, 17" LCD Monitor.OEMモデルの説明
The Tencor FLX-2320 is an equipment that accurately measures film stress at temperatures from -65°C to 500°C, using dual wavelength technology to work on all types of films, including transparent ones like silicon nitride. This helps better understand film properties in simulated process environments.ドキュメント
ドキュメントなし
同様のリスト
すべて表示
KLA
FLX 2320
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66000
ウェーハサイズ：
6"/150mm
ヴィンテージ：
1993
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説明
*.Installed in a clean room and can demonstrate any time.構成
*.Measurement -Speed: 5 sec. for 150mm wafer. -Range: 2x10E7 ~ 4x10E7 dyne/cm2 -RMS Noise: 0.0001 mE-1(radius=10,000 meters) -Resolution:0.00003mE-1(33 kilometers) -Min scan setp: 0.02mm -Max Points Per Scan: 1250 -Min Radius: 2.0m(for 80mm scan length) -Temperature Range: room temperature ~ 500 C *.Light Source: 670nm(3mW), 750nm(3mW) Laser. *.Dimension: 46cm(18")x46cm(18")x56cm(22") plus computer. *.Weight: 45.5Kg *.Utility -Operation temperature: 18~22 C(64~72F) -Gas Connection: Cooling gas(Nitrogen, Class 100 Air) -Power: 115V, 11A, 50/60Hz -Computer: Pentium 200Mhz,32MB RAM, 3GB HDD, 17" LCD Monitor.OEMモデルの説明
The Tencor FLX-2320 is an equipment that accurately measures film stress at temperatures from -65°C to 500°C, using dual wavelength technology to work on all types of films, including transparent ones like silicon nitride. This helps better understand film properties in simulated process environments.ドキュメント
ドキュメントなし