説明
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers構成
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEMモデルの説明
提供なしドキュメント
ドキュメントなし
N & K
8000-CD
検証済み
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
21701
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
N & K
8000-CD
カテゴリ
Thin Film / Film Thickness
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
21701
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
N&K 8000 CD Trench Depth & Thin film Measurement Fully Automated Thin Film Metrology System for Patterned and Unpatterned Wafers構成
Working DUV - Vis - NIR: 190nm to 1000nm Reflectance, Polarized Analyzer Unit with spot size : 50 um Cognex Pattern Recognition Software Windows 7 Operating System S/W Version : 10.5.3.0 n&k's Thin Film Characterization S/W n&k's Standard Films Library Automated Wafer Loading/Unloading Assyst Loadport for 8" Wafers Computerized X-Y stage for full wafer mapping, and wafer alignment capability Z-stage to accommodate multiple substrate thickness SEMI and CE Certification Application : Simultaneously determines thickness, n and k of thin films including semiconductors ,dielectronic (SiO2, Si3N4),etc, Polymers (Photoresist, etc),and very thin metals - Thin Film : Film Thickness / n and k - OCD : Depth / CD / ProfileOEMモデルの説明
提供なしドキュメント
ドキュメントなし