説明
説明なし構成
構成なしOEMモデルの説明
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.ドキュメント
ドキュメントなし
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS
検証済み
カテゴリ
Thin Film
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
38056
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
ONTO / NANOMETRICS / ACCENT / BIO-RAD
ATLAS
カテゴリ
Thin Film
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
38056
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
構成なしOEMモデルの説明
The Nanometrics Atlas™ is an advanced metrology system that can accommodate both 200 or 300 mm wafer metrology. It features a dual-arm robot, high-precision stage, and high-speed focus system. The system also boasts robust pattern recognition, improved thickness reproducibility, and superior throughput. The N2000 software interface and advanced automation are compliant with industry standards, and the NanoNet feature provides system-to-system matching and seamless recipe transferability. The Atlas can be configured with a combination of metrology modules, including Spectroscopic Reflectometer (SR), Spectroscopic Ellipsometer (SE), Optical Critical Dimension (OCD), Diffraction Based Overlay (DBO), and Wafer Stress/Bow.ドキュメント
ドキュメントなし