説明
Nanometrics Nanospec 6100UV Thin Film Thickness Measurement構成
WORKING Measurement Range : 25- 20 - 500-200 um with the visible light source (400 to 800nm halogen lamp) - 25- 500with UV light source (210 - 400nm Deuterium lamp). Linear Array Head Automated focusing Joystick-automated stage with twin chuck ( 8inch, 6inch) CV -S3200 CCD Camera Objectives (Auto revolver) : Olympus 4X, 10X, 15X 2D and 3D wafer-mapping software S/W Version : 1.63, OS : Windows 2000OEMモデルの説明
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.ドキュメント
ドキュメントなし
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 6100
検証済み
カテゴリ
Thin Film
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66024
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
ONTO / NANOMETRICS / ACCENT / BIO-RAD
NANOSPEC 6100
カテゴリ
Thin Film
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
66024
ウェーハサイズ：
8"/200mm
ヴィンテージ：
2007
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Nanometrics Nanospec 6100UV Thin Film Thickness Measurement構成
WORKING Measurement Range : 25- 20 - 500-200 um with the visible light source (400 to 800nm halogen lamp) - 25- 500with UV light source (210 - 400nm Deuterium lamp). Linear Array Head Automated focusing Joystick-automated stage with twin chuck ( 8inch, 6inch) CV -S3200 CCD Camera Objectives (Auto revolver) : Olympus 4X, 10X, 15X 2D and 3D wafer-mapping software S/W Version : 1.63, OS : Windows 2000OEMモデルの説明
The NanoSpec 6100 is a tabletop film analysis system that provides fast and low-cost measurement capabilities for thin film metrology. It uses non-contact spectroscopic reflectometry to measure sites as small as 10µm in diameter on production wafers and can measure wafer substrates in the size range of 75 to 200mm and photomasks from 5 to 9 inches square. The system can measure film thickness in the range of 200Å - 20µm with the visible light source and 25Å - 20µm with an optional UV light source. The upper thickness range can be extended to 70µm with the thick film option. The system also has a motorized, precision x-y sample stage with a resolution of better than 1µm and a high-resolution color graphics display that provides contour and 3D film thickness mapping.ドキュメント
ドキュメントなし