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LAM RESEARCH CORPORATION ONTRAK SYNERGY
    説明
    Post CMP cleaner with HEPA mini-environment
    構成
    構成なし
    OEMモデルの説明
    Synergy is a cleaning technology that combines OnTrak’s Double-Sided Scrubbing (DSS®) technology with in-situ chemical etching, resulting in a new level of cleaning called Chemical Mechanical Cleaning (CMC™). This single-step process offers maximum cleaning performance while maintaining high throughput. Synergy makes use of high-purity chemicals to extend cleaning capability to include embedded particle removal, trace metal removal, and damaged oxide layer removal.
    ドキュメント

    ドキュメントなし

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    verified-listing-icon

    検証済み

    カテゴリ
    Wafer Scrubber

    最終検証: 60日以上前

    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    74795


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION ONTRAK SYNERGY

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    Wafer Scrubber
    ヴィンテージ: 1997状態: 中古
    最終確認60日以上前

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    verified-listing-icon
    検証済み
    カテゴリ
    Wafer Scrubber
    最終検証: 60日以上前
    listing-photo-f37b768120654ac88be92e9d80d88a50-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    74795


    ウェーハサイズ:

    8"/200mm


    ヴィンテージ:

    不明


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    Post CMP cleaner with HEPA mini-environment
    構成
    構成なし
    OEMモデルの説明
    Synergy is a cleaning technology that combines OnTrak’s Double-Sided Scrubbing (DSS®) technology with in-situ chemical etching, resulting in a new level of cleaning called Chemical Mechanical Cleaning (CMC™). This single-step process offers maximum cleaning performance while maintaining high throughput. Synergy makes use of high-purity chemicals to extend cleaning capability to include embedded particle removal, trace metal removal, and damaged oxide layer removal.
    ドキュメント

    ドキュメントなし

    同様のリスト
    すべて表示
    LAM RESEARCH CORPORATION ONTRAK SYNERGY

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    Wafer Scrubberヴィンテージ: 1997状態: 中古最終検証: 60日以上前
    LAM RESEARCH CORPORATION ONTRAK SYNERGY

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    Wafer Scrubberヴィンテージ: 0状態: 中古最終検証: 60日以上前
    LAM RESEARCH CORPORATION ONTRAK SYNERGY

    LAM RESEARCH CORPORATION

    ONTRAK SYNERGY

    Wafer Scrubberヴィンテージ: 0状態: 改修済み最終検証: 60日以上前