説明
説明なし構成
SC1 and DIW ScrubOEMモデルの説明
The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 wafers per hour (200% of the previous system). Unique function is also equipped to realize the prevention of contamination during wafer transport, while keeping high productivity. In addition, the Atomized Spray 2 (AS2) and brushes succeeding from the previous system was improved. The NS300Z provides a wide range of scrubber clean process with high productivity even in cutting-edge device manufacturing.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
NS300Z
検証済み
カテゴリ
Wafer Scrubber
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
80182
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
NS300Z
検証済み
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
80182
ウェーハサイズ：
12"/300mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
SC1 and DIW ScrubOEMモデルの説明
The features of the NS300+ HT process module - renowned for its reliability and stability - have been carried on into the new NS300Z, a more productive scrubber. The system has an 8-process spin chamber and achieves a throughput of up to 1,000 wafers per hour (200% of the previous system). Unique function is also equipped to realize the prevention of contamination during wafer transport, while keeping high productivity. In addition, the Atomized Spray 2 (AS2) and brushes succeeding from the previous system was improved. The NS300Z provides a wide range of scrubber clean process with high productivity even in cutting-edge device manufacturing.ドキュメント
ドキュメントなし