説明
Etching machine構成
構成なしOEMモデルの説明
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
SS4
検証済み
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112569
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
同様のリスト
すべて表示
TEL / TOKYO ELECTRON
SS4
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
112569
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
Etching machine構成
構成なしOEMモデルの説明
The SS-4 is a stand-alone wafer scrubber system developed by TEL. It is based on the Clean Track Mark 7 photoresist processing system and utilizes the Mark 7’s non-vacuum wafer handling capability. With TEL’s unique brushes and mechanical chuck, the SS-4 is capable of cleaning both sides of the wafer on a carrier-to-carrier basis, contributing remarkably to enhancing the megabit process yield. The SS-4 also offers the option to expand the variety of cleaning processes by combining the brush with a jet or Megasonic cleaning dispenser. Additionally, the SS-4 features TEL’s newest cleaning head, the hydraulic membrane head, which can be used with patterned, hydrophobic surfaces and even soft metal layers, expanding the applications for which scrubbers can be used.ドキュメント
ドキュメントなし