説明
説明なし構成
* Up to Eight (8) Inch Wafer Compatibility including Unmounted Wafers as well as Tape Ring and Film Frame mounted Wafers * Up to 6 programmable recipes * Spin speeds adjustable from front potentiometers * Up to 9" square (mask) capability *Oscillating High Pressure D.I. Water Fan Jet Assembly, adjustable to 2500 PSI, for Effective and Efficient Cleaning. Adjustment via regulator on pump * Nitrogen Blow-off for Rapid and Effective Dry * Infrared Heat Lamp for Complete Drying * Built in Vacuum Wafer Hold-down * Efficient Chamber Exhaust and Drain * Built-in Exhaust Blower * Built-in Safety Interlocks and Positive Lid Locking During Process CycleOEMモデルの説明
提供なしドキュメント
ドキュメントなし
ULTRA-T EQUIPMENT / UTE
SWC 111
検証済み
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
60433
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
ULTRA-T EQUIPMENT / UTE
SWC 111
カテゴリ
Wafer Scrubber
最終検証： 60日以上前
主なアイテムの詳細
状態：
Refurbished
稼働ステータス:
不明
製品ID：
60433
ウェーハサイズ：
8"/200mm
ヴィンテージ：
不明
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
* Up to Eight (8) Inch Wafer Compatibility including Unmounted Wafers as well as Tape Ring and Film Frame mounted Wafers * Up to 6 programmable recipes * Spin speeds adjustable from front potentiometers * Up to 9" square (mask) capability *Oscillating High Pressure D.I. Water Fan Jet Assembly, adjustable to 2500 PSI, for Effective and Efficient Cleaning. Adjustment via regulator on pump * Nitrogen Blow-off for Rapid and Effective Dry * Infrared Heat Lamp for Complete Drying * Built in Vacuum Wafer Hold-down * Efficient Chamber Exhaust and Drain * Built-in Exhaust Blower * Built-in Safety Interlocks and Positive Lid Locking During Process CycleOEMモデルの説明
提供なしドキュメント
ドキュメントなし