説明
説明なし構成
Process: Pre-diffusion clean HF (50:1) POU SC-1 HQDR SC-2 HQDR SD2 DryerOEMモデルの説明
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.ドキュメント
ドキュメントなし
TEL / TOKYO ELECTRON
UW-200Z
検証済み
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
36804
ウェーハサイズ：
不明
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
UW-200Z
カテゴリ
Wet Benches - Auto
最終検証： 60日以上前
主なアイテムの詳細
状態：
Used
稼働ステータス:
不明
製品ID：
36804
ウェーハサイズ：
不明
ヴィンテージ：
2006
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
説明
説明なし構成
Process: Pre-diffusion clean HF (50:1) POU SC-1 HQDR SC-2 HQDR SD2 DryerOEMモデルの説明
The UW200Z is a state-of-the-art automated wet station designed for advanced front-end-of-line (FEOL) cleans, etch, and resist strip in 300mm and 200mm wafer mass production environments. It achieves high productivity through reduced dry time and the ability to process multiple chemistries in a single point-of-use bath. The system is also designed for low cost of ownership, with reduced requirements for deionized water, chemicals, and exhaust. It is compliant with SECS/GEM host communication, S2-0200 and CE mark compliance, and FM compliance. The UW200Z also features a stacked dual chamber dryer (SD2) with in-situ chemical injection for process flexibility and watermark-less drying performance. Overall, the UW200Z offers a versatile and efficient solution for advanced wafer processing.ドキュメント
ドキュメントなし