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LAM RESEARCH / SEZ SP102
    説明
    No missing parts
    構成
    102N -Spin processor
    OEMモデルの説明
    The SEZ 102 is a Spin-Processor for single wafer processing. It supports 3, 4, 5, and 6-inch wafers on 150mm and has multiple vertically integrated process chambers. The system is fully automatic and can recycle, heat, and filter chemical solutions. It supports a wide range of applications including photolithography yield enhancement, back surface metal clean, back surface film removal, bevel/edge film removal, silicon etch, stress relief, post-etch polymer removal, oxide etching, post CMP clean, film structuring (BEOL), wafer manufacturing enhancement, and GaAs processing.
    ドキュメント

    LAM RESEARCH / SEZ

    SP102

    verified-listing-icon

    検証済み

    カテゴリ

    Wet Etch
    最終検証: 60日以上前
    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    89163


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    2003

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    同様のリスト
    すべて表示
    LAM RESEARCH / SEZ SP102
    LAM RESEARCH / SEZSP102Wet Etch
    ヴィンテージ: 2003状態: 中古
    最終確認60日以上前

    LAM RESEARCH / SEZ

    SP102

    verified-listing-icon

    検証済み

    カテゴリ

    Wet Etch
    最終検証: 60日以上前
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    主なアイテムの詳細

    状態:

    Used


    稼働ステータス:

    不明


    製品ID:

    89163


    ウェーハサイズ:

    6"/150mm


    ヴィンテージ:

    2003


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    説明
    No missing parts
    構成
    102N -Spin processor
    OEMモデルの説明
    The SEZ 102 is a Spin-Processor for single wafer processing. It supports 3, 4, 5, and 6-inch wafers on 150mm and has multiple vertically integrated process chambers. The system is fully automatic and can recycle, heat, and filter chemical solutions. It supports a wide range of applications including photolithography yield enhancement, back surface metal clean, back surface film removal, bevel/edge film removal, silicon etch, stress relief, post-etch polymer removal, oxide etching, post CMP clean, film structuring (BEOL), wafer manufacturing enhancement, and GaAs processing.
    ドキュメント
    同様のリスト
    すべて表示
    LAM RESEARCH / SEZ SP102
    LAM RESEARCH / SEZ
    SP102
    Wet Etchヴィンテージ: 2003状態: 中古最終検証: 60日以上前